optics

Layout

To allow for the different applications the optical layout has to be flexible. Two main configurations can be distinguished:

The positions for the main components are: 

Mirror 1 collimates the beam in vertical direction by a mechanical bender, thus increasing the energy resolution. It has three stripes with different coatings (Pt, Rh, Si) to adapt reflectivity and harmonic suppression to the different energy ranges. Besides, it also reduces the heat load on the monochromator and is therefore externally water cooled. The glancing angle of the mirror is 2mrad.

The crystal in the monochromator downstream M1 is a Si 111. To preserve energy resolution and flux at the sample under high heat load the crystals are externally cooled with liquid nitrogen. By doing this either thermal expansion is reduced as well as the conductivity of silicon is increased compared to room temperature values.

(I) Mirrored mode 7 - 40keV                         

(II) Un-mirrored mode >40keV

 For high pressure and total scattering experiments it is important to access considerable high energies. For this setup the mirror can be moved out of the beam path. Instead a KB- mirror system using Multilayers can be inserted to focus the beam on station 1. The KB-mirror is applicable in the energy range of about 20-50keV and can also be used together with the collimating mirror M1. They are placed 1.1m and 0.7m upstream station 1 on a granite table.